Direct resistance profile for an electrical pulse induced resistance change device

Applied Physics Letters

Volumn 87, Issue 23, 2005, Pages 1-3

  Chen, X ^a   Wu, N J ^a   Strozier, J ^a   Ignatiev, A ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL PULSE INDUCED RESISTANCE CHANGE (EPIR) DEVICES; HYSTERESIS LOOPS; KELVIN PROBE MICROSCOPY; RESISTANCE PROFILES;

ELECTRIC RESISTANCE; NONVOLATILE STORAGE; RANDOM ACCESS STORAGE; SURFACE CHEMISTRY; SWITCHING;

THIN FILM DEVICES;

EID: 28444445912     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2139843     Document Type: Article

References (12)

1. Y. Tokura, Phys. Today 56, 50 (2003).
2. S. Q. Liu, N. J. Wu, and A. Ignatiev, Appl. Phys. Lett. 76, 2749 (2000).
3. W. W. Zhuang, W. Pan, B. D. Ulrich, J. J. Lee, L. Stecker, A. Burmaster, D. R. Evans, S. T. Hsu, M. Tajiri, A. Shimaoka, K. Inoue, T. Naka, N. Awaya, K. Sakiyama, Y. Wang, S. Q. Liu, N. J. Wu, and A. Ignatiev, Tech. Dig. - Int. Electron Devices Meet. 2002, 193 (2002).
4. E. Dagotto, Science 309, 257 (2005).
5. C. U. Pinnow and T. Mikolajick, J. Electrochem. Soc. 151, K13 (2004).
6. A. Sawa, T. Fuji, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. 85, 4073 (2004).
7. A. Baikalov, Y. Q. Wang, B. Shen, B. Lorenz, S. Tsui, Y. Y. Sun, Y. Y. Xue, and C. W. Chu, Appl. Phys. Lett. 83, 957 (2003).
8. K. Aoyama, K. Waku, A. Asanuma, Y. Uesu, and T. Katsufuji, Appl. Phys. Lett. 85, 1208 (2004).
9. F. Robin, H. Jacobs, O. Homan, A. Stemmer, and W. Bachtold, Appl. Phys. Lett. 76, 2907 (2000).
10. M. Nonnenmacher, M. P. O'Boyle, and H. K. Wickramasinghe, Appl. Phys. Lett. 58, 2921 (1991).
11. K. P. Puntambekar, P. V. Pesavento, and C. D. Frisbie, Appl. Phys. Lett. 83, 5539 (2003).
12. X. Chen, J. Strozier, N. J. Wu, A. Ignatiev, and Y. B. Nian, arXiv: cond-mat/0510059 3 Oct. 2005.