Hydrogen passivation of LPCVD Si3 N4 SiO2 Si stacks by ammonia plasma Treatment

Journal of the Electrochemical Society

Volumn 154, Issue 6, 2007, Pages

  Jin, Hao ^a,b   Weber, K J ^a   Blakers, A W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b ELECTROCHEMICAL SOCIETY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA PLASMA TREATMENT; INTERFACE DEFECTS; NITRIDE FILMS;

AMMONIA; CONCENTRATION (PROCESS); HYDROGEN; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PASSIVATION; PLASMA APPLICATIONS; SILICA;

SILICON NITRIDE;

EID: 34547206280     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2716561     Document Type: Article

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