Model of vapor-induced resistivity changes in gold-thiolate monolayer-protected nanoparticle sensor films

Analytical Chemistry

Volumn 79, Issue 13, 2007, Pages 4977-4986

  Steinecker, William H ^a,b   Rowe, Michael P ^a   Zellers, Edward T ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SCHLUMBERGER DOLL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMIRESISTORS; FILM SWELLING EFFICIENCIES; MICROANALYTICAL SYSTEMS; ORGANIC VAPORS; PARTITION COEFFICIENTS;

MONOLAYERS; NANOPARTICLES; PERMITTIVITY; SIGNAL TO NOISE RATIO; SORPTION;

THIN FILMS;

GOLD; NANOPARTICLE; OCTANE; THIOL;

ARTICLE; CHEMICAL INTERACTION; CONCENTRATION (PARAMETERS); ELECTRIC RESISTANCE; FILM; MATHEMATICAL MODEL; MICROANALYSIS; PARTITION COEFFICIENT; SHEAR FLOW; THICKNESS; VAPOR;

ABSORPTION; ALGORITHMS; BIOSENSING TECHNIQUES; CALIBRATION; GASES; GOLD; MEMBRANES, ARTIFICIAL; MODELS, THEORETICAL; NANOPARTICLES; ORGANIC CHEMICALS; PRESSURE; SENSITIVITY AND SPECIFICITY; SULFHYDRYL COMPOUNDS; SURFACE PROPERTIES; VOLATILIZATION;

EID: 34447306340     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac070068y     Document Type: Article

References (63)

1. Brust, M.; Walker, M.; Bethell, D.; Schiffrin, D. J.; Whyman, R. J. Chem. Soc., Chem. Commun. 1994, 7, 801-802.
2. Pasquato, L.; Pengo, P.; Scrimin, P. J. Mater. Chem. 2004, 14 (24), 3481-3487.
3. Daniel, M.-C.; Astruc, D. Chem. Rev. 2004, 104 (1), 293-346.
4. Templeton, A. C.; Wuelfing, W. P.; Murray, R. W. Acc. Chem. Res. 2000, 33 (1), 27-36.
5. Rosi, N. L.; Mirkin, C. A. Chem. Rev. 2005, 105, 1547-1562.
6. Wohltjen, H.; Snow, A. W. Anal. Chem. 1998, 70 (14), 2856-2859.
7. Wohltjen, H.; Snow, A. W. PCT Int. Appl. WO A1 9927357, 1999.
8. Jarvis, N. L.; Wohltjen, H.; Snow, A. W. Proceedings of the 3rd International Aviation Security Technology Symposium, Atlantic City, NJ, 2001; pp 639-647.
9. Snow, A. W.; Wohltjen, H.; Jarvis, N. L. NRL Review; Naval Research Laboratories: Washington, DC, 2002.
10. Foos, E. E.; Snow, A. W.; Twigg, M.; Ancona, M. G. Chem. Mater. 2002, 14, 2401-2408.
11. Evans, S. D.; Johnson, S. R.; Cheng, Y. L.; Shen, T. J. Mater. Chem. 2000, 10 (1), 183-188.
12. Han, L.; Daniel, D. R.; Maye, M. M.; Zhong, C. J. Anal. Chem. 2001, 73 (18), 4441-4449.
13. Han, L.; Shi, X.; Wu, W.; Kirk, F. L.; Luo, J.; Wang, L.; Mott, D.; Cousineau, L.; Lim, S. I.-I.; Lu, S.; Zhong, C.-J. Sens. Actuators, B 2005, B106 (1), 431-441.
14. Cai, Q.-Y.; Zellers, E. T. Anal. Chem. 2002, 74 (14), 3533-3539.
15. Steinecker, W. H.; Rowe, M.; Matzger, A.; Zellers, E. T. Proceedings of the 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Transducers '03, Boston, MA, June 8-12, 2003; p 1343.
16. Krasteva, N.; Besnard, I.; Guse, B.; Bauer, R. E.; Muellen, K.; Yasuda, A.; Vossmeyer, T. Nano Lett. 2002, 2 (5), 551-555.
17. Joseph, Y.; Besnard, I.; Rosenberger, M.; Guse, B.; Nothofer, H.-G.; Wessels, J. M.; Wild, U.; Knop-Gericke, A.; Su, D.; Schloegl, R.; Yasuda, A.; Vossmeyer, T. J. Phys. Chem. B 2003, 107 (30), 7406-7413.
18. Joseph, Y.; Krasteva, N.; Besnard, I.; Guse, B.; Rosenberger, M.; Wild, U.; Knop-Gericke, A.; Schloegl, R.; Krustev, R.; Yasuda, A.; Vossmeyer, T. Faraday Discuss. 2004, 125, 77-97.
19. Wessels, J. M.; Nothofer, H.-G.; Ford, W. E.; von Wrochem, F.; Scholz, F.; Vossmeyer, T.; Schroedter, A.; Weller, H.; Yasuda, A. J. Am. Chem. Soc. 2004, 126 (10), 3349-3356.
20. Yang, C.-Y.; Li, C.-L.; Lu, C.-J. Anal. Chim. Acta 2006, 565 (1), 17-26.
21. Pang, P.; Guo, Z.; Cai, Q. Talanta 2005, 65 (5), 1343-1348.
22. Pang, P.; Guo, J.; Wu, S.; Cai, Q. Sens. Actuators, B 2006, B114 (2), 799-803.
23. Leopold, M. C.; Donkers, R. L.; Georganopoulou, D.; Fisher, M.; Zamborini, F. P.; Murray, R. W. Faraday Discuss. 2004, 125, 63-76.
24. Zamborini, F. P.; Leopold, M. C.; Hicks, J. F.; Kulesza, P. J.; Malik, M. A.; Murray, R. W. J. Am. Chem. Soc. 2002, 124 (30), 8958-8964.
25. (a) Grate, J. W.; Nelson, D. A.; Skaggs, R. Anal. Chem. 2003, 75 (8), 1868-1879.
26. (b) Grate, J. W. Anal. Chem. 2003, 75, 6759.
27. Severin, E. J.; Lewis, N. S. Anal. Chem. 2000, 72 (9), 2008-2015.
28. Patel, S. V.; Jenkins, M. W.; Hughes, R. C.; Yelton, W. G.; Ricco, A. J. Anal. Chem. 2000, 72 (7), 1532-1542.
29. Swann, M. J.; Glidle, A.; Cui, L.; Barker, J. R.; Cooper, J. M. Chem. Commun. 1998, 24, 2753-2754.
30. Hierlemann, A.; Zellers, E. T.; Ricco, A. J. Anal. Chem. 2001, 73 (14), 3458-3466.
31. Grate, J. W. Chem. Rev. 2000, 100 (7), 2627-2647.
32. Albert, K. J.; Walt, D. R.; Gill, D. S.; Pearce, T. C. Anal. Chem. 2001, 73 (11), 2501-2508.
33. Kummer, A. M.; Hierlemann, A.; Baltes, H. Anal. Chem. 2004, 76 (9), 2470-2477.
34. Patel, S. V.; Mlsna, T. E.; Fruhberger, B.; Klaassen, E.; Cemalovic, S.; Baselt, D. R. Sens. Actuators, B 2003, B96 (3), 541-553.
35. Kim, B. H.; Prins, F. E.; Kern, D. P.; Raible, S.; Weimar, U. Sens. Actuators B 2001, B78 (1-3), 12-18.
36. Senesac, L. R.; Dutta, P.; Datskos, P. G.; Sepaniak, M. J. Anal. Chim. Acta 2006, 558, 94-101.
37. Terrill, R. H.; Postlethwaite, T. A.; Chen, C.; Poon, C.-D.; Terzis, A.; Chen, A.; Hutchison, J. E.; Clark, M. R.; Wignall, G.; Londono, J. D.; Superfine, R.; Falvo, M.; Johnson, C. S., Jr.; Samulski, E. T.; Murray, R. W. J. Am. Chem. Soc. 1995, 117 (50), 12537-12548.
38. Wuelfing, W. P.; Green, S. J.; Pietron, J. J.; Cliffel, D. E.; Murray, R. W. J. Am. Chem. Soc. 2000, 122 (46), 11465-11472.
39. Zamborini, F. P.; Smart, L. E.; Leopold, M. C.; Murray, R. W. Anal. Chim. Acta 2003, 496 (1-2), 3-16.
40. Hostetler, M. J.; Wingate, J. E.; Zhong, C.-J.; Harris, J. E.; Vachet, R. W.; Clark, M. R.; Londono, J. D.; Green, S. J.; Stokes, J. J.; Wignall, G. D.; Glish, G. L.; Porter, M. D.; Evans, N. D.; Murray, R. W. Langmuir 1998, 14 (1), 17-30.
41. Snow, A. W.; Wohltjen, H. Chem. Mater. 1998, 10 (4), 947-949.
42. Brust, M.; Bethell, D.; Schffrin, D. J.; Kiely, C. J. Adv. Mater. 1995, 7 (9), 795-797.
43. Neugebauer, C. A.; Webb, M. B. J. Appl. Phys. 1962, 33, 74-82.
44. Neugebauer, C. A. Thin Solid Films 1970, 6 (6), 443-447.
45. Sheng, P.; Abeles, B. Phys. Rev. Lett. 1972, 28 (1), 34-37.
46. Abeles, B.; Sheng, P.; Coutts, M. D.; Arte, Y. Adv. Phys. 1975, 24 (3), 407-461.
47. Lu, C.-J.; Steinecker, W. H.; Tian, W.-C.; Oborny, M. C.; Nichols, J. M.; Agah, M.; Potkay, J. A.; Chan, H. K. L.; Driscoll, J.; Sacks, R. D.; Wise, K. D.; Pang, S. W.; Zellers, E. T. Lab Chip 2005, 5 (10), 1123-1131.
48. Zhong, Q.; Veeneman, R.; Steinecker, W.; Jia, C.; Batterman, S.; Zellers, E. T. J. Environ. Monit. 2007, 9, 440-448.
49. Peak widths of <100 ms have been measured with a similar C8-MPN-coated CR sensor in a low-dead-volume detector cell downstream from a micro-fabricated column using a microfabricated pump for sample transport. Kim, H.; Steinecker, W. H.; Lambertus, G. R.; Astle, A. A.; Najafi, K.; Zellers, E. T.; Bernal, L. P.; Washabaugh, P. D.; Wise K. D. Proceedings 10th International Conference on Miniaturized Systems for Chemistry and Life Sciences-μTAS '06, Tokyo, Japan, November 5-9, 2006; pp 1037-1039.
50. Rowe, M. P.; Plass, K. E.; Kim, K.; Kurdak, C.; Zellers, E. T.; Matzger, A. J. Chem. Mater. 2004, 16 (18), 3513-3517.
51. Ballantine, D. S., Jr.; White, R. M.; Martin, S. J.; Ricco, A. J.; Zellers, E. T.; Frye, G. C.; Wohltjen, H. Acoustic Wave Sensors. Theory, Design, and Physico-Chemical Applications; Academic Press: San Diego, CA, 1997.
52. s.
53. Waters, C. A.; Mills, A. J.; Johnson, K. A.; Schiffrin, D. J. Chem. Commun. 2003, 540-541.
54. Howard, P. H., Meylan, W. M. Eds. Handbook of physical properties of organic chemicals; CRC-Lewis: Boca Raton, FL, 1997.
55. Smith, B. D.; Srivastava, R. Thermodynamic data for pure compounds; Elsevier: New York, 1986.
56. Weast, R. C., Ed. CRC Handbook of Chemistry and Physics, 76th ed.; CRC Press: Boca Raton, FL, 1995.
57. A coated CR noise level of 1 ppm represents a typical resolution obtained after circuit optimization. Higher and lower values were observed. Observed noise levels were determined by the circuit components employed, since replacing the CR with a common resistor of identical resistance yielded no reduction in noise. This was true for type A, B, and C devices, indicating that the observed noise is independent of device size over the range examined here. MPN films have been shown to exhibit classical 1/f noise with a fundamental lower limit that is theoretically much lower than that reported here. With the proper implementation of analog circuitry for amplification and filtering, baseline noise could be reduced by 1 or 2 orders of magnitude (see ref 57).
58. Kurdak, C.; Kim, J.; Kuo, A.; Lucido, J. J.; Farina, L. A.; Bai, X.; Rowe, M. P.; Matzger, A. J. Appl. Phys. Lett. 2005, 86 (7), 073506.
59. Grate, J. W.; Klusty, M. Anal. Chem. 1991, 63, 1719-1727.
60. (a) Hierlemann, A.; Ricco, A. J.; Bodenhöfer, K; Dominik, A.; Göpel, W. Anal. Chem. 2000, 72, 3696-3708.
61. (b) Patrash, S. J.; Zellers, E. T. Anal. Chem. 1993, 65, 2055-2066.
62. Grate, J. W.; Wise, B. M. Anal. Chem. 2001, 73, 2239-2244.
63. Porter, M. D.; Bright, T. B.; Allara, D. L.; Chidsey, C. E. D. J. Am. Chem. Soc. 1987, 109 (12), 3559-3568.