Controlling surface roughness in vapor-deposited poly (amic acid) films by solvent-vapor exposure

Langmuir

Volumn 20, Issue 15, 2004, Pages 6288-6296

  Anthamatten, Mitchell ^a,b   Letts, Stephan A ^a   Cook, Robert C ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b University of Rochester   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL SURFACE CONCENTRATION; INERTIAL CONFINEMENT FUSION (ICF); SOLVENT-VAPOR EXPOSURE; SURFACE SMOOTHING;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAVIMETRIC ANALYSIS; MATHEMATICAL MODELS; SECONDARY ION MASS SPECTROMETRY; SOLVENTS; SORPTION; SURFACE ROUGHNESS; SURFACE TENSION;

THIN FILMS;

FOURIER ANALYSIS; GRAVIMETRY; MASS SPECTROMETERS; ROUGHNESS; SOLVENTS; SORPTION; SURFACE TENSION; THIN FILMS;

EID: 3442901340     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0497797     Document Type: Article

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