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Volumn 154, Issue 8, 2007, Pages

Electrodeposition of Cu on Ta-based layers: I. Electrodeposition on Ta

Author keywords

[No Author keywords available]

Indexed keywords

ACID SULFATE COPPER PLATING ELECTROLYTES; BASIC CITRATE ELECTROLYTES; CITRATE CHEMISTRY; HIGH CURRENT EFFICIENCY;

DEPOSITION RATES; ELECTRODEPOSITION; ELECTROLYTES; NUCLEATION; TANTALUM;

COPPER COMPOUNDS;

EID: 34347351323 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2744153 Document Type: Article

Times cited : (15)

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