The UV-nanoimprint lithography with multi-head nanoimprinting unit for sub-50nm half-pitch patterns

2006 SICE-ICASE International Joint Conference

Volumn , Issue , 2006, Pages 4902-4904

  Lee, Jae Jong ^a   Choi, Kee Bong ^a   Kim, Gee Hong ^a   Lee, Seungwoo ^a   Cho, Hyuntaek ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Flexure mechanism; Multi head imprinting unit; Quartz stamp; UV nanoimprinting lithography

Indexed keywords

FLEXURE MECHANISM; MULTI-HEAD IMPRINTING UNITS; QUARTZ STAMP; UV NANOIMPRINTING LITHOGRAPHY;

COST REDUCTION; MICROPROCESSOR CHIPS; SEMICONDUCTING SILICON; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

COMPUTER CHIPS; LITHOGRAPHY; PATTERNS;

EID: 34250709504     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SICE.2006.314809     Document Type: Conference Paper

References (4)

1. Chou S. Y. and Krauss P. R., "Imprint Lithography with Sub-10 nm Feature Size and High Throughput," Microelectronic Engineering, Vol.35, pp.237-240, 1997.
2. Choi B. J. Sreenivasan S. V., Johnson S., Colburn M. and Wilson C. G., "Design of Orientation Stage for Step and Flash Imprint Lithography," Precision Engineering, Vol 25, pp. 192-199, 2001.
3. Choi K.B., "Kinematic Analysis and Optimal Design of 3-PPR Planar Parallel Manipulator," KSME International journal, Vol. 17, No. 4, pp. 528-537, 2003.
4. M.M. Alkaisi, et al, "Multilevel Nanoimprint Lithography," Current Applied Physics, No.4, 2004.