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Volumn 19, Issue 7, 2007, Pages 925-928

New magnetic properties of silicon/silicon oxide interfaces

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC MATERIALS; MAGNETIC RESONANCE SPECTROSCOPY; MAGNETISM; MONOLAYERS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34250685072     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200601762     Document Type: Article
Times cited : (50)

References (25)
  • 21
    • 34250678487 scopus 로고    scopus 로고
    • XPS results for a wafer treated with KOH etching. The percentage reflects the fraction of the total XPS signal. 21.987% C; 29.421% Si(wafer); 9.918% Si(ox); 36.816% O; 0.000% Fe; 0.019% Co: 0.009% Ni; 0.009% Mn; 0.00982029% Gd; 0.009% Eu; 0.618% N; 0.520% Ca; 0.147% Na; 0.127% Zn; 0.382% Mg.
    • XPS results for a wafer treated with KOH etching. The percentage reflects the fraction of the total XPS signal. 21.987% C; 29.421% Si(wafer); 9.918% Si(ox); 36.816% O; 0.000% Fe; 0.019% Co: 0.009% Ni; 0.009% Mn; 0.00982029% Gd; 0.009% Eu; 0.618% N; 0.520% Ca; 0.147% Na; 0.127% Zn; 0.382% Mg.
  • 22
    • 34250612224 scopus 로고    scopus 로고
    • -2)) for a gap of 300 μm, which corresponds to the thickness of the sample after etching.
    • -2)) for a gap of 300 μm, which corresponds to the thickness of the sample after etching.
  • 24
    • 34250662623 scopus 로고    scopus 로고
    • In a few samples, when treated only with HF, an unusual diamagnetic signal was noted. Presently studies are being carried out to reveal the conditions under which this diamagnetic signal is obtained
    • In a few samples, when treated only with HF, an unusual diamagnetic signal was noted. Presently studies are being carried out to reveal the conditions under which this diamagnetic signal is obtained.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.