Carbon loss induced by plasma beam irradiation in porous silica films

Journal of Applied Physics

Volumn 101, Issue 11, 2007, Pages

  Kurihara, K ^a,c   Ono, T ^a   Kohmura, K ^a   Tanaka, H ^a   Fujii, N ^a   Hata, N ^b   Kikkawa, T ^b  

^a MIRAI ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; CARBON; HYDROPHOBICITY; IRRADIATION; PLASMA APPLICATIONS; POROUS SILICON; SECONDARY ION MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON CONTENT; PLASMA BOMBARDMENT; PLASMA INDUCED DAMAGES; POROUS SILICA FILMS;

THIN FILMS;

EID: 34250681021     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2740334     Document Type: Article

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