Measurements of desorbed products by plasma beam irradiation on SiO 2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2311-2314

  Kurihara, Kazuaki ^a,b   Yamaoka, Yoshikazu ^a   Karahashi, Kazuhiro ^a   Sekine, Makoto ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; DESORPTION; ELECTRON CYCLOTRON RESONANCE; FLUOROCARBONS; IRRADIATION; MASS SPECTROMETRY; PARAMETER ESTIMATION; PLASMA ETCHING;

DESORBED PRODUCTS; ION ENERGY; PLASMA BEAMS; PLASMA PARAMETERS;

SILICON COMPOUNDS;

EID: 10244236548     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1795830     Document Type: Article

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