The enhancement of poly activation by laser annealing

Proceedings - Electrochemical Society

Volumn PV 2005-05, Issue , 2005, Pages 171-178

  Chen, Yuanning ^a   Jain, Amitabh ^a   Hu, Jerry ^a   Mercer, Doug ^a   Hebb, Jeff ^b   Upadhyaya, Deepak ^b   Wang, Yun ^b  

^a TEXAS INSTRUMENTS   (United States)

^b Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LASER BEAM EFFECTS; LEAKAGE CURRENTS; SEMICONDUCTOR DOPING; THERMAL EFFECTS; THRESHOLD VOLTAGE;

LASER ANNEALING; POLY ACTIVATION;

POLYSILICON;

EID: 31844438440     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

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2. H. Y. Wong, H. Takeuchi, T.J. King, M. Ameen and A. Agarwal, Electrochem. Soc. Symp. Proc. Vol. 2004-1, (2004) 205.
3. A. Shima, Y. Wang, S. Talwar and A. Hiraiwa, Symp. on VLSI Tech. (2004) 174.