Fabrication and characterization of Bi0.4Te3.0Sb1.6 thin films by flash evaporation method

Journal of Alloys and Compounds

Volumn 441, Issue 1-2, 2007, Pages 246-250

  Takashiri, M ^a,b   Shirakawa, T ^b   Miyazaki, K ^b,c   Tsukamoto, H ^b  

^a KOMATSU LTD   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Annealing; Flash evaporation; Thermoelectric; Thin film

Indexed keywords

ANNEALING; ARGON; ATMOSPHERIC PRESSURE; CHARACTERIZATION; FABRICATION; TEMPERATURE DISTRIBUTION; THIN FILMS; X RAY SPECTROSCOPY;

FLASH EVAPORATION METHOD; GLASS SUBSTRATES; GRAIN BOUNDARY SCATTERING;

BISMUTH ALLOYS;

EID: 34250178400     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.09.136     Document Type: Article

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