A hybrid CO2 laser processing for silicon etching

Optics Express

Volumn 15, Issue 12, 2007, Pages 7269-7274

  Chung, C K ^a   Wu, M Y ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRONIC STRUCTURE; LIGHT ABSORPTION; NEODYMIUM LASERS; SILICON; WET ETCHING;

LASER PROCESSING; SILICON ETCHING; SURFACE OXIDATION;

CARBON DIOXIDE LASERS;

EID: 34250155673     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.007269     Document Type: Article

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