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Volumn 910, Issue , 2007, Pages 219-224
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Detection of SiH3 radicals and cluster formation in a highly H2 diluted SiH4 VHF plasma by means of time resolved cavity ring down spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ELECTRODES;
GROWTH KINETICS;
HYDROGENATION;
MICROCRYSTALLINE SILICON;
PLASMAS;
THIN FILMS;
ELECTRODE SURFACE;
SI:H GROWTH;
VHF PLASMA;
FREE RADICALS;
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EID: 34249941115
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (1)
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References (15)
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