Detection of SiH3 radicals and cluster formation in a highly H2 diluted SiH4 VHF plasma by means of time resolved cavity ring down spectroscopy

Materials Research Society Symposium Proceedings

Volumn 910, Issue , 2007, Pages 219-224

  Nagai, Takehiko ^a   Smets, Arno H M ^a   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ELECTRODES; GROWTH KINETICS; HYDROGENATION; MICROCRYSTALLINE SILICON; PLASMAS; THIN FILMS;

ELECTRODE SURFACE; SI:H GROWTH; VHF PLASMA;

FREE RADICALS;

EID: 34249941115     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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