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Volumn 680, Issue , 2011, Pages 268-273
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Carrier-density fluctuation noise and the interface trap density in GaN/AlGaN HFETs
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
COMPUTER SIMULATION;
ELECTRON TRAPS;
GALLIUM NITRIDE;
GATE DIELECTRICS;
SILICON WAFERS;
NOISE RESPONSE;
TRAP DENSITY;
TRAP DISTRIBUTION;
FIELD EFFECT TRANSISTORS;
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EID: 34249904660
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-680-e9.13 Document Type: Conference Paper |
Times cited : (4)
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References (11)
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