Plasma induced chemical changes at silica surfaces during pre-bonding treatments

Materials Research Society Symposium Proceedings

Volumn 681, Issue , 2001, Pages 24-29

  Hansen, Darren M ^a   Albaugh, C E ^b   Moran, Peter D ^a   Kuech, T F ^a  

^a University of Wisconsin Madison   (United States)

^b XAVIER UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; REACTIVE ION ETCHING; SEMICONDUCTING GALLIUM ARSENIDE; WAFER BONDING;

ABSORBANCE BANDS; PLASMA INDUCED CHEMICAL CHANGES; PLASMA TREATMENT; PRE BONDING TREATMENT;

SILICA;

EID: 34249888465     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-681-i2.2     Document Type: Conference Paper

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