Oxidation and induced damage in oxygen plasma in situ wafer bonding

Journal of the Electrochemical Society

Volumn 147, Issue 7, 2000, Pages 2699-2703

  Pasquariello, Donato ^a   Hedlund, Christer ^a   Hjort, Klas ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; DIFFUSION IN SOLIDS; ELECTRIC POTENTIAL; INTERFACES (MATERIALS); INTERFACIAL ENERGY; OXIDATION; OXYGEN; PLASMA APPLICATIONS;

PLASMA ACTIVATED WAFER BONDING;

SILICON WAFERS;

EID: 0034224095     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393592     Document Type: Article

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