Low-pressure chemical vapor deposition of borosilicate glasses and their application to wafer bonding

Materials Research Society Symposium - Proceedings

Volumn 587, Issue , 2000, Pages

  Hansen, Darren M ^a   Moran, Peter D ^a   Kuech, T F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; ATOMIC FORCE MICROSCOPY; BONDING; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICA; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

WAFER BONDING;

BOROSILICATE GLASS;

EID: 18144443904     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)