Correlation between crystal orientation, channeling contrast and topography during FIB milling of Cu studied by FIB, EBSD, SEM, and AFM

Praktische Metallographie/Practical Metallography

Volumn 44, Issue 5, 2007, Pages 236-238

  Wendt, Ulrich ^a   Nolze, Gert ^b  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; CRYSTAL ORIENTATION; FOCUSED ION BEAMS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION; TOPOGRAPHY;

CHANNELING CONTRAST; ELECTRON BACKSCATTER DIFFRACTION (EBSD); MILLING DEPTH; MILLING RATE;

COMMINUTION;

EID: 34249787890     PISSN: 0032678X     EISSN: None     Source Type: Journal    
DOI: 10.3139/147.100340     Document Type: Article

References (6)

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4. Kempshall, B.W.; Schwarz, S.M.; Prenitzer, B.I.; Giannuzzi, L.A.; Irwin R.B.; Stevie F.A.: J. Vac. Sci. Technol. B 19 (2001) 749-754
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6. Wendt, U.; Stiebe-Lange, K.; Smid, M.; J. Microsc. 207 (2002) 169-179