Planarizing CVD diamond films by using hydrogen plasma etching enhanced carbon diffusion process

Diamond and Related Materials

Volumn 16, Issue 8, 2007, Pages 1455-1458

  Man, W D ^a,b   Wang, J H ^a   Wang, C X ^a   Wang, S G ^a   Xiong, L W ^a  

^a WUHAN INSTITUTE OF TECHNOLOGY   (China)

^b INSTITUTE OF PLASMA PHYSICS   (China)

Author keywords

Carbon diffusion; Diamond film; Microwave plasma CVD; Plasma etching

Indexed keywords

DIFFUSION; GRAPHITIZATION; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROWAVE DEVICES; PLASMA ETCHING; POLYCRYSTALLINE MATERIALS;

CARBON DIFFUSION PROCESS; IRON CHLORIDE SOLUTION; MECHANICAL LAPPING; PLASMA AMBIENT;

DIAMOND LIKE CARBON FILMS;

EID: 34249035766     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.102     Document Type: Article

References (10)

1. May P.W. Philos. Trans. R. Soc. Lond., A 358 (2000) 473
2. Malshe A.P., Park B.S., Brown W.D., et al. Diamond Relat. Mater. 8 (1999) 119
3. Wang J.Y., Bai Y.Z., Chen H.Y., et al. J. Funct. Mater. Devices 7 3 (2001) 240
4. Weima J.A. J. Solid State Electrochem. 5 (2001) 112
5. Weima J.A., Job R., Fahrmer W.R., et al. J. Appl. Phys. 89 4 (2001) 2434
6. Kim S.H. J. Korean Chem. Soc. 45 4 (2001) 351
7. Zaitsev A.M., Kosaca G., Richarz B., et al. Diamond Relat. Mater. 7 (1998) 1108
8. Ramesham R., and Rose M.F. Thin Solid Films 320 (1998) 223
9. Man W.D., Wang J.H., Ma Z.B., and Wang C.X. Surf. Coat. Technol. 171 (2002) 241
10. Leech P.W., Reeves G.K., Holland A.S., et al. Diamond Relat. Mater. 11 (2002) 833