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Volumn 171, Issue 1-3, 2003, Pages 241-246
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Plasma boronitriding of WC(Co) substrate as an effective pretreatment process for diamond CVD
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Author keywords
Adhesion; Boronitriding; Cemented carbide; Diamond coatings
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Indexed keywords
ADHESION;
CATALYSIS;
CHEMICAL VAPOR DEPOSITION;
DIAMOND FILMS;
PROTECTIVE COATINGS;
SUBSTRATES;
SURFACES;
TUNGSTEN CARBIDE;
PLASMA BORONITRIDING;
PLASMA THEORY;
ADHESION;
BORON NITRIDE;
CHEMICAL VAPOR DEPOSITION;
CUTTING TOOL;
DIAMOND COATING;
TUNGSTEN CARBIDE;
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EID: 0038721106
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00279-2 Document Type: Article |
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Times cited : (15)
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References (12)
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