Application of PECVD SiC in glass micromachining

Journal of Micromechanics and Microengineering

Volumn 17, Issue 4, 2007, Pages 775-780

  Zhang, Haixia ^a   Guo, Hui ^a   Chen, Zhe ^a   Zhang, Guobing ^a   Li, Zhihong ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTEGRATED CIRCUIT MANUFACTURE; LOW TEMPERATURE OPERATIONS; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

ETCH ANGLE; INTERFACE ADHESION; PYREX GLASS MICROMACHINING; SILICON CARBIDE MASKS;

GLASS FIBERS;

EID: 34248999479     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/4/014     Document Type: Conference Paper

References (12)

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