SCOPUS 정보 검색 플랫폼

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 332-336

Formation of nano iridium oxide: Material properties and neural cell culture

(8) Lee, In Seop a Whang, Chung Nam a Lee, Young Hee b Hwan Lee, Gun c Park, Bong Joo d Park, Jong Chul d Seo, Won Seon e Cui, Fu Zhai f

a Yonsei University (South Korea)

b Yonsei University Wonju College of Medicine (South Korea)

c Korea Institute of Machine and Materials (South Korea)

d Yonsei University College of Medicine (South Korea)

e Korea Institute of Ceramic Engineering and Technology (KICET) (South Korea)

f TSINGHUA UNIVERSITY (China)

Author keywords

Charge injection; Cortical neural cell; E beam evaporation; Nano iridium oxide; Neurofilament

Indexed keywords

CATHODES; CELL CULTURE; DEPOSITION; ELECTRIC FIELDS; ELECTRON BEAMS; EVAPORATION; METALLIC FILMS; NEUROLOGY; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

CHARGE INJECTION; CORTICAL NEURAL CELLS; ELECTRON(E)-BEAM EVAPORATION; NANO IRIDIUM OXIDES; NEUROFILAMENTS;

IRIDIUM COMPOUNDS;

EID: 13444251181 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.08.076 Document Type: Conference Paper

Times cited : (24)

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