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1
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0036421239
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Torsional MEMS scanner design for high-resolution display systems
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Seattle, Washington, July
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H. Urey, "Torsional MEMS scanner design for high-resolution display systems", Proceedings of SPIE, Seattle, Washington, Vol. 4773, July 2002, pp. 27-37.
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(2002)
Proceedings of SPIE
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Urey, H.1
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2
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0037122108
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Process-induced strain in silicon-on-insulator materials
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A. Tiberj, B. Fraisse, C. Blanc, S. Contreras, J. Camassel, "Process-induced strain in silicon-on-insulator materials", Journal of Physics: Condensed Matter, Vol. 14, 2002, pp. 13411-13416.
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(2002)
Journal of Physics: Condensed Matter
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Tiberj, A.1
Fraisse, B.2
Blanc, C.3
Contreras, S.4
Camassel, J.5
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3
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4344614531
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A 5-V Operated MEMS Variable Optical Attenuator by SOI Bulk Micromachining
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May/June
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K. Isamoto, K. Kato, A. Morosawa, C. Chong, H. Fujita, H. Toshiyoshi, "A 5-V Operated MEMS Variable Optical Attenuator by SOI Bulk Micromachining", IEEE Journal of Selected Topics in Quantum Electronics. Vol. 10, No. 3, May/June 2004, pp. 570-578.
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(2004)
IEEE Journal of Selected Topics in Quantum Electronics
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, Issue.3
, pp. 570-578
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Isamoto, K.1
Kato, K.2
Morosawa, A.3
Chong, C.4
Fujita, H.5
Toshiyoshi, H.6
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4
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0036124051
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A Rotational Comb-driven Micromirror with a Large Deflection Angle and Low Drive Voltage
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Las Vegas, Nevada
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O. Tsuboi, Y. Mizuno, N. Koma, H. Soneda, H. Okuda, S. Ueda, I. Sawaki, F. Yamagishi, "A Rotational Comb-driven Micromirror with a Large Deflection Angle and Low Drive Voltage", Proceedings of the IEEE MEMS Conference, Las Vegas, Nevada, 2002, pp. 532-535.
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(2002)
Proceedings of the IEEE MEMS Conference
, pp. 532-535
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Tsuboi, O.1
Mizuno, Y.2
Koma, N.3
Soneda, H.4
Okuda, H.5
Ueda, S.6
Sawaki, I.7
Yamagishi, F.8
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5
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0036851061
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Large-Displacement Vertical Microlens Scanner With Low Driving Voltage
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November
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S. Kwon, V. Milanovic, L. P. Lee, "Large-Displacement Vertical Microlens Scanner With Low Driving Voltage", IEEE Photonics Letters, Vol. 14, No. 11, November 2002, pp. 1572-1574.
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(2002)
IEEE Photonics Letters
, vol.14
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, pp. 1572-1574
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Kwon, S.1
Milanovic, V.2
Lee, L.P.3
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6
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3042823621
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A Clean Wafer-Scale Chip-Release Process without Dicing based on Vapor Phase Etching
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Maastricht, The Netherlands
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T. Overstolz, P. A. Clerc, W. Noell, M. Zickar, and N. F. de Rooij, "A Clean Wafer-Scale Chip-Release Process without Dicing based on Vapor Phase Etching", Proceedings of the IEEE MEMS Conference, Maastricht, The Netherlands. 2004, pp. 717-720.
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(2004)
Proceedings of the IEEE MEMS Conference
, pp. 717-720
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Overstolz, T.1
Clerc, P.A.2
Noell, W.3
Zickar, M.4
de Rooij, N.F.5
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7
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33750114777
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Quasi-dry Release for Micro Electro-Mechanical Systems
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Baden-Baden, Germany
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M. Zickar, W. Noell, T. Overstolz, C. Spörl, and N. F. de Rooij, "Quasi-dry Release for Micro Electro-Mechanical Systems", Proceedings of the COMS Conference, Baden-Baden, Germany, 2005, pp. 611-616.
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(2005)
Proceedings of the COMS Conference
, pp. 611-616
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Zickar, M.1
Noell, W.2
Overstolz, T.3
Spörl, C.4
de Rooij, N.F.5
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