Modeling the radiative properties of microscale random roughness surfaces

Journal of Heat Transfer

Volumn 129, Issue 1, 2007, Pages 71-78

  Fu, Kang ^a   Hsu, Pei Feng ^a  

^a Florida Institute of Technology ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE DIFFERENCE TIME DOMAIN METHOD; HEAT RADIATION; MAXWELL EQUATIONS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTOR DOPING; SILICON WAFERS; SURFACE ROUGHNESS; TEMPERATURE CONTROL;

ARC/FLASH-ASSISTED HEATING; BI-DIRECTIONAL REFLECTIVITY; DOPING LEVEL;

RAPID THERMAL PROCESSING;

FINITE DIFFERENCE TIME DOMAIN METHOD; HEAT RADIATION; MAXWELL EQUATIONS; PROBABILITY DENSITY FUNCTION; RAPID THERMAL PROCESSING; SEMICONDUCTOR DOPING; SILICON WAFERS; SURFACE ROUGHNESS; TEMPERATURE CONTROL;

EID: 34248366574     PISSN: 00221481     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.2401200     Document Type: Article

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