Plasma cleaning for W polymetal gate

Solid State Phenomena

Volumn 103-104, Issue , 2005, Pages 59-62

  Kabansky, Alex ^a   Lee, Harry ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

Defects; EDX; Plasma cleaning; Polymetal gate; Residual film; Selective oxidation; TEM

Indexed keywords

EID: 34248165202     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.103-104.59     Document Type: Conference Paper

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