Real-time monitoring of organic vapor-phase deposition of molecular thin films using high-pressure reflection high-energy electron diffraction

Applied Physics Letters

Volumn 90, Issue 18, 2007, Pages

  Lunt, Richard R ^b   Benziger, Jay B ^b   Forrest, Stephen R ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

COPPER PHTHALOCYANINE; GROWTH MORPHOLOGY; MOLECULAR THIN FILMS; ORGANIC VAPOR PHASE DEPOSITION (OVPD);

DEPOSITION; DEPOSITION RATES; FILM GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; HIGH PRESSURE EFFECTS; MICROCRYSTALLINE SILICON; MONOLAYERS; SILICA;

THIN FILMS;

EID: 34247846344     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2736274     Document Type: Article

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