Growth of amorphous TeOx(2≤x≤3) thin film by radio frequency sputtering

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Dewan, Namrata ^a   Gupta, Vinay ^a   Sreenivas, K ^a   Katiyar, R S ^b  

^a UNIVERSITY OF DELHI   (India)

^b UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; ELASTIC CONSTANTS; FILM GROWTH; INFRARED SPECTROSCOPY; STOICHIOMETRY; SYNTHESIS (CHEMICAL); TELLURIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

DISPHENOID; TELLURIUM OXIDE; TRIGONAL PYRAMIDS;

THIN FILMS;

EID: 34247842882     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2717139     Document Type: Article

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