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Volumn 40, Issue 10-11, 2005, Pages 1023-1027

Rf-sputtering growth of stoichiometric amorphous TeO2 thin films

Author keywords

RBS; Sputtering; Tellurium oxide; TEM; Thin film

Indexed keywords

AMORPHOUS MATERIALS; SPUTTERING; STOICHIOMETRY; SUBSTRATES; TELLURIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; TRANSPARENCY; X RAY DIFFRACTION;

EID: 27744459919     PISSN: 02321300     EISSN: None     Source Type: Journal    
DOI: 10.1002/crat.200410479     Document Type: Conference Paper
Times cited : (8)

References (16)
  • 16
    • 0000760943 scopus 로고    scopus 로고
    • SIMNRA, a simulation program for the analysis of NRA, RBS and ERDA
    • Proceedings of the 15th International Conference on the Application of Accelerators in Research and Industry, J. L. Duggan and I.L. Morgan (eds.)
    • M. Mayer, "SIMNRA, a Simulation Program for the Analysis of NRA, RBS and ERDA", Proceedings of the 15th International Conference on the Application of Accelerators in Research and Industry, J. L. Duggan and I.L. Morgan (eds.), American Institute of Physics Conference Proceedings 475, p. 541 (1999).
    • (1999) American Institute of Physics Conference Proceedings , vol.475 , pp. 541
    • Mayer, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.