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Volumn 40, Issue 10-11, 2005, Pages 1023-1027
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Rf-sputtering growth of stoichiometric amorphous TeO2 thin films
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Author keywords
RBS; Sputtering; Tellurium oxide; TEM; Thin film
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Indexed keywords
AMORPHOUS MATERIALS;
SPUTTERING;
STOICHIOMETRY;
SUBSTRATES;
TELLURIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
TRANSPARENCY;
X RAY DIFFRACTION;
DEPOSITION PARAMETERS;
RBS;
SPUTTERING GAS;
SUBSTRATE TEMPERATURE;
TELLERIUM OXIDE;
THIN FILMS;
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EID: 27744459919
PISSN: 02321300
EISSN: None
Source Type: Journal
DOI: 10.1002/crat.200410479 Document Type: Conference Paper |
Times cited : (8)
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References (16)
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