In situ evaluation of plane plasma

Plasma Devices and Operations

Volumn 13, Issue 1, 2005, Pages 9-18

  Golan, G ^a   Axelevitch, A ^a   Croitoru, N ^b   Inberg, A ^b   Gorenstein, B ^a  

^a OPEN UNIVERSITY OF ISRAEL   (Israel)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

Langmuir probe; Plane plasma discharge; Silver thin film; Triode sputtering

Indexed keywords

DISCHARGE LAMPS; METALLIZING; MICROELECTROMECHANICAL DEVICES; PLASMAS; SPUTTERING; THICKNESS MEASUREMENT; THIN FILMS; VLSI CIRCUITS;

LANGMUIR PROBE; PLANE PLASMA DISCHARGE; SILVER THIN FILMS; TRIODE SPUTTERING;

FILM GROWTH;

EID: 12344283178     PISSN: 10519998     EISSN: None     Source Type: Journal    
DOI: 10.1080/10519990412331317074     Document Type: Article

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