Structure evolution on annealing of copper-doped carbon film

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6672-6675

  Onoprienko, A A ^a   Danilenko, N I ^a   Kossko, I A ^a  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

Amorphous carbon; Electron diffraction; Sputtering; Structure; Thermal stability; Transmission electron microscopy

Indexed keywords

ANNEALING; COPPER; DOPING (ADDITIVES); ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

ARGON PLASMA; DIFFUSION COALESCENCE; PARTICLE AVERAGE SIZE;

CARBON FILMS;

EID: 34247577551     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.007     Document Type: Article

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