Effect of magnetron discharge power on the resistivity and microstructure of carbon films

Surface and Coatings Technology

Volumn 200, Issue 14-15, 2006, Pages 4174-4178

  Onoprienko, A A ^a   Artamonov, V V ^b   Yanchuk, I B ^b  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

Amorphous carbon; Electrical resistance; Magnetron sputtering; Raman spectroscopy; Structure

Indexed keywords

CARBON; CRYSTAL MICROSTRUCTURE; ELECTRIC RESISTANCE; GRAPHITE; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; TEMPERATURE MEASUREMENT; THERMAL EFFECTS;

AMORPHOUS CARBON FILMS; MAGNETRON DISCHARGE POWER; SURFACE TEMPERATURE;

AMORPHOUS FILMS;

AMORPHOUS FILMS; CARBON; CRYSTAL MICROSTRUCTURE; ELECTRIC RESISTANCE; GRAPHITE; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; TEMPERATURE MEASUREMENT; THERMAL EFFECTS;

EID: 33644764909     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.12.003     Document Type: Article

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