RF magnetron-sputtering deposition of pyroelectric lithium tantalate thin films on ruthenium dioxide

Journal of Crystal Growth

Volumn 304, Issue 1, 2007, Pages 90-96

  Combette, Philippe ^a   Nougaret, Laurianne ^a   Giani, Alain ^a   Pascal delannoy, Frédérique ^a  

^a UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

A3. Physical vapor depostion processes; A3. Polycrystalline deposition; B2. Dielectric materials; B2. Ferroelectric materials; B3. Infrared devices

Indexed keywords

FERROELECTRIC MATERIALS; GROWTH TEMPERATURE; INFRARED DEVICES; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; MORPHOLOGY; PYROELECTRICITY;

GAS PRESSURE; PENTOXIDES; PHYSICAL VAPOR DEPOSITION PROCESSES; POLYCRYSTALLINE DEPOSITION; THERMAL DETECTORS;

THIN FILMS;

EID: 34247574682     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.02.006     Document Type: Article

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