Growth of MgO thin films with subsequent fabrication of ZnO rods: Structural and photoluminescence properties

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6433-6437

  Kim, Hyoun Woo ^a   Shim, Seung Hyun ^a   Lee, Jong Woo ^a  

^a Inha University   (South Korea)

Author keywords

Atomic layer deposition; MgO; Thermal evaporation; ZnO

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM GROWTH; MAGNESIUM COMPOUNDS; PHOTOLUMINESCENCE; THERMAL EVAPORATION; TRANSMISSION ELECTRON MICROSCOPY; ZINC COMPOUNDS;

MAGNESIUM OXIDE (MGO) FILMS; PHOTOLUMINESCENCE PROPERTIES; ZNO RODS;

THIN FILMS;

EID: 34247463722     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.071     Document Type: Article

References (31)

1. Grant J.L., Cooper R., Zeglinski P., and Boas J.F. J. Chem. Phys. 90 (1989) 807
2. Summers G.P., Wilson T.M., Jeffries B.T., Tohver H.T., Chen Y., and Abraham M.M. Phys. Rev., B 27 (1983) 1283
3. Rosenblatt G.H., Rowe M.W., Williams Jr. G.P., Williams R.T., and Chen Y. Phys. Rev., B 39 (1989) 10309
4. Stample P.A., and Kennedy R.J. J. Cryst. Growth 191 (1998) 472
5. Tarsa E.J., De Graef M., Clarke D.R., Gossard A.C., and Speck J.S. J. Appl. Phys. 73 (1993) 3276
6. Chang L.D., Tseng M.Z., Hu E.L., and Fork D.K. Appl. Phys. Lett. 60 (1992) 1753
7. Hatanpaa T., Ihanus J., Kansikas J., Mutikainen I., Ritala M., and Leskela M. Chem. Mater. 11 (1999) 1846
8. Sung M.M., Kim C., Kim C.G., and Kim Y. J. Cryst. Growth 210 (2000) 651
9. Fujii E., Tomazawa A., Fujii S., Torii H., Takayama R., and Hirao T. Jpn. J. Appl. Phys. 33 (1994) 6331
10. Vuoristo P., Mantyla T., and Kettunen P. J. Vac. Sci. Technol., A, Vac. Surf. Films 4 (1986) 2932
11. Kim S.G., Kim J.Y., and Kim H.J. Thin Solid Films 376 (2000) 110
12. Huang M.H., Wu Y., Feick H., Tran N., Weber E., and Yang P. Adv. Mater. 13 (2001) 113
13. Suntola T. Appl. Surf. Sci. 100/101 (1996) 391
14. Luo Y., Slater D., Han M., Moryl J., Osgood Jr. R.M., and Chen J.G. Langmuir 14 (1998) 1493
15. Kim H.W., Kim N.H., Myung J.H., and Shim S.H. Phys. Status Solidi, A Appl. Res. 202 (2005) 1758
16. Lim J., Shin K., Kim H., and Lee C. Thin Solid Films 475 (2005) 256
17. Chou T.-L., and Ting J.-M. Thin Solid Films 494 (2006) 291
18. Hao Y., Meng G., Ye C., Zhang X., and Zhang L. J. Phys. Chem., B 109 (2005) 11204
19. Deepak F.L., Saldanha P., Vivekchand S.R.C., and Govindaraj A. Chem. Phys. Lett. 417 (2006) 535
20. Kalyanikutty K.P., Deepak F.L., Edem C., Govindaraj A., and Rao C.N.R. Mater. Res. Bull. 40 (2005) 831
21. Zhang J., and Zhang L. Chem. Phys. Lett. 363 (2002) 293
22. Rosenblatt G.H., Rowe M.W., Williams Jr. G.P., Williams R.T., and Chen Y. Phys. Rev., B 39 (1989) 10309
23. Vanheusden K., Warren W.L., Seager C.H., Tallant D.R., Voigt J.A., and Gnade B.E. J. Appl. Phys. 79 (1996) 7983
24. Wu X.L., Siu G.G., Fu C.L., and Ong H.C. Appl. Phys. Lett. 78 (2001) 2285
25. Nakanishi Y., Miyake A., Kominami H., Aoki T., Hatanaka Y., and Shimaoka G. Appl. Surf. Sci. 142 (1999) 233
26. Reynolds D.C., Look D.C., Jogai B., Litton C.W., Collins T.C., Harsch W., and Cantwell G. Phys. Rev., B 57 (1998) 12151
27. Jung S.W., Park W.I., Cheong H.D., Yi G.-C., Jang H.M., Hong S., and Joo T. Appl. Phys. Lett. 80 (2002) 1924
28. Lim J., Shin K., Kim H.W., and Lee C. Mater. Sci. Eng., B, Solid-state Mater. Adv. Technol. 107 (2004) 301
29. Zhang X.T., Liu Y.C., Zhi Z.Z., Zhang J.Y., Lu Y.M., Shen D.Z., Xu W., Fan X.W., and Kong X.G. J. Lumin. 99 (2002) 149
30. Tang Z.K., Wong G.K.L., Yu P., Kawasaki M., Ohtomo A., Koinuma H., and Segawa Y. Appl. Phys. Lett. 72 (1998) 3270
31. Wang Z.-J., Wang Z.-J., Zhang L.-G., Yuan J.-S., Yan S.-G., and Wang C.-Y. Chin. Phys. Lett. 20 (2003) 696