SCOPUS 정보 검색 플랫폼

Volumn 42, Issue 3, 2007, Pages 299-303

Dielectric properties and I-V characteristics of (Pb0.4Sr 0.6)TiO3 thin films improved by TiO2 buffer layers

Author keywords

(Pb,Sr)TiO3 film; Electrical properties; Sol gel; TiO2 buffer layer

Indexed keywords

CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; LEAKAGE CURRENTS; PERMITTIVITY; SURFACE ROUGHNESS; TITANIUM DIOXIDE;

CHEMICAL SOLUTION DEPOSITION; LEAKAGE CURRENT DENSITY; THIN BUFFER LAYERS;

THIN FILMS;

EID: 34247375182 PISSN: 09280707 EISSN: None Source Type: Journal
DOI: 10.1007/s10971-006-0649-9 Document Type: Article

Times cited : (14)

References (16)

1
- 0030231618
- Kawahara T, Yamamuka M, Yuuki A, Ono K (1996) Japn J Appl Phys 35:4880
- (1996) Japn J Appl Phys , vol.35 , pp. 4880
- Kawahara, T.¹ Yamamuka, M.² Yuuki, A.³ Ono, K.⁴

2
- 0035082228
- Chung HJ, Woo SI, Vac J (2001) Sci Technol B 19:275
- (2001) Sci Technol B , vol.19 , pp. 275
- Chung, H.J.¹ Woo, S.I.² Vac, J.³

3
- 28344442509
- Liu SW, Weaver J, Yuan Z, Donner W, Chen CL, Jiang JC, Meletis EI, Chang W, Kirchoefer SW, Horwitz J, Bhalla A (2005) Appl Phys Lett 87:142905
- (2005) Appl Phys Lett , vol.87 , pp. 142905
- Liu, S.W.¹ Weaver, J.² Yuan, Z.³ Donner, W.⁴ Chen, C.L.⁵ Jiang, J.C.⁶ Meletis, E.I.⁷ Chang, W.⁸ Kirchoefer, S.W.⁹ Horwitz, J.¹⁰ Bhalla, A.¹¹

4
- 8644226934
- Liu SW, Lin Y, Weaver J, Donner W, Chen X, Chen CL, Jiang JC, Meletis EI, Bhalla A (2004) Appl Phys Lett 85:3202
- (2004) Appl Phys Lett , vol.85 , pp. 3202
- Liu, S.W.¹ Lin, Y.² Weaver, J.³ Donner, W.⁴ Chen, X.⁵ Chen, C.L.⁶ Jiang, J.C.⁷ Meletis, E.I.⁸ Bhalla, A.⁹

5
- 0242335952
- Vorobiev A, Rundqvist P, Khamchane K, Gevorgian S (2003) Appl Phys Lett 83:3144
- (2003) Appl Phys Lett , vol.83 , pp. 3144
- Vorobiev, A.¹ Rundqvist, P.² Khamchane, K.³ Gevorgian, S.⁴

6
- 0037011103
- Kim KT, Kim CI (2002) Thin Solid Films 420(1):544
- (2002) Thin Solid Films , vol.420 , Issue.1 , pp. 544
- Kim, K.T.¹ Kim, C.I.²

7
- 0036827737
- Jain M, Majumder SB, Guo R, Bhalla AS, Katiyar RS (2002) Mater Lett 56:692
- (2002) Mater Lett , vol.56 , pp. 692
- Jain, M.¹ Majumder, S.B.² Guo, R.³ Bhalla, A.S.⁴ Katiyar, R.S.⁵

8
- 85058249085
- Chung HJ, Chung SJ, Kim JH, Woo SI (2001) Thin Solid Films 394:213
- (2001) Thin Solid Films , vol.394 , pp. 213
- Chung, H.J.¹ Chung, S.J.² Kim, J.H.³ Woo, S.I.⁴

9
- 10944262315
- Kim ID, Tuller HL, Kim US, Park JS (2004) Appl Phys Lett 85:4705
- (2004) Appl Phys Lett , vol.85 , pp. 4705
- Kim, I.D.¹ Tuller, H.L.² Kim, U.S.³ Park, J.S.⁴

10
- 10444245783
- Higuchi T, Nakamura M, Hachisu Y, Saitoh M, Hattori T, Tsukamoto T (2004) Jap J Appl Phys 43:6585
- (2004) Jap J Appl Phys , vol.43 , pp. 6585
- Higuchi, T.¹ Nakamura, M.² Hachisu, Y.³ Saitoh, M.⁴ Hattori, T.⁵ Tsukamoto, T.⁶

11
- 22044451506
- Kalo K, Suzuki K, Tanaka K, Fu D, Nishizawa K, Miki T (2004) Appl Phys A 81(4):861
- (2004) Appl Phys A , vol.81 , Issue.4 , pp. 861
- Kalo, K.¹ Suzuki, K.² Tanaka, K.³ Fu, D.⁴ Nishizawa, K.⁵ Miki, T.⁶

12
- 27844580370
- Kim HS, Kim HG, Kim ID, Kim KB, Lee JC (2005) Appl Phys Lett 87:212903
- (2005) Appl Phys Lett , vol.87 , pp. 212903
- Kim, H.S.¹ Kim, H.G.² Kim, I.D.³ Kim, K.B.⁴ Lee, J.C.⁵

13
- 33750236038
- Lee K, Rhee BR, Lee C (2001) Integr Ferroelectr 39(1-4): 1093
- (2001) Integr Ferroelectr , vol.39 , Issue.1-4 , pp. 1093
- Lee, K.¹ Rhee, B.R.² Lee, C.³

14
- 12344333246
- Pontes FM, Leal SH, Santos MRMC, Leite ER, Longo E, Soledade LEB, Chiquito AJ, Machado MAC, Varela JA (2003) Appl Phys A 80(4):875
- (2003) Appl Phys A , vol.80 , Issue.4 , pp. 875
- Pontes, F.M.¹ Leal, S.H.² Santos, M.R.M.C.³ Leite, E.R.⁴ Longo, E.⁵ Soledade, L.E.B.⁶ Chiquito, A.J.⁷ Machado, M.A.C.⁸ Varela, J.A.⁹

15
- 0036865491
- Jeon YA, Shin WC, Seo TS, Yoon SG (2002) J Mater Res 17:2831
- (2002) J Mater Res , vol.17 , pp. 2831
- Jeon, Y.A.¹ Shin, W.C.² Seo, T.S.³ Yoon, S.G.⁴

16
- 34247368706
- Shin WC, Yoon SG (2001) Appl Phys Lett 79:10
- (2001) Appl Phys Lett , vol.79 , pp. 10
- Shin, W.C.¹ Yoon, S.G.²

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