Experimental study of carrier transport in multi-layered structures

Microelectronics Reliability

Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 610-614

  Tao, Guoqiao ^a   Ouvrard, Cedric ^a   Chauveau, Helene ^a   Nath, Som ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE DISTRIBUTION; DATA STORAGE EQUIPMENT; FLASH MEMORY; GATES (TRANSISTOR); MULTILAYERS;

CHARGE REDISTRIBUTION; MULTI-LAYERED STRUCTURES; NITRIDE LAYERS; POOLE-FRENKEL CONDUCTION MECHANISMS;

CARRIER TRANSPORT;

EID: 34247154851     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2007.01.051     Document Type: Article

References (8)

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