Properties of the roughness in NiFe/FeMn exchange-biased system

Applied Surface Science

Volumn 253, Issue 14, 2007, Pages 6248-6254

  Nascimento, V P ^a   Passamani, E C ^b   Biondo, A ^b   Nunes, V B ^c   Saitovitch, E Baggio ^d  

^a FEDERAL RURAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b FEDERAL UNIVERSITY OF ESPÍRITO SANTO   (Brazil)

^c PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^d CENTRO BRASILEIRO DE PESQUISAS FÍSICAS   (Brazil)

Author keywords

AFM; Exchange bias; Interface roughness; Magnetron sputtering; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; IMAGE ANALYSIS; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; REFLECTION; SURFACE ROUGHNESS; WAVELENGTH;

INTERFACIAL ROUGHNESS; LAYER DEPOSITION; ROUGHNESS ENHANCEMENT; X-RAY REFLECTIVITY;

SURFACES;

EID: 34247102249     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.095     Document Type: Article

References (37)

1. Takano K., Kodama R.H., Berkowitz A.E., Cao W., and Thomas G. Phys. Rev. Lett. 79 (1997) 1130
2. Nogués J., Ivan K., and Schuller. J. Magn. Magn. Mater. 192 (1999) 203
3. Meiklejohn W.H., and Bean C.P. Phys. Rev. 102 (1956) 1413
4. Meiklejohn W.H., and Bean C.P. Phys. Rev. 105 (1957) 904
5. Meiklejohn W.H., and Bean C.P. J. Appl. Phys. 33 (1962) 1328
6. Berkowitz A.E. J. Magn. Magn. Mater. 200 (1999) 552
7. Stamps R.L. J. Phys. D 33 (2000) R247
8. March N.H., Lambin P., and Herman F. J. Magn. Magn. Mater. 44 (1984) 1
9. Kools J.C.S. IEEE Trans. Magn. 32 (1996) 3165
10. Engel B.N., Akerman J., Butcher B., Dave R.W., DeHerrera M., Durlam M., Grynkewich G., Janesky J., Pietambaram S.V., Rizzo N.D., Slaughter J.M., Smith K., Sun J.J., and Tehrani S. IEEE Trans. Magn. 41 (2005) 132
11. Parkin S.S.P., Jiang X., Kaiser C., Panchula A., Roche K., and Samant M. Proc. IEEE 91 (2003) 661
12. Liu C., Yu C., Jiang H., Shen L., and Alexander C. J. Appl. Phys. 87 (2000) 6644
13. Nogués J., Moran T.J., Lederman D., Schuller I.K., and Rao K.V. Phys. Rev. B 59 (1999) 6984
14. Lederman D., Nogués J., and Schuller I.K. Phys. Rev. B 56 (1997) 2332
15. Nogués J., Moran T.J., Lederman D., Schuller I.K., and Rao K.V. Appl. Phys. Lett. 68 (1996) 3186
16. Uyama H., Otani Y., Fukamichi K., Iwasaki H., and Sahashi M. J. Magn. Soc. Jpn. 21 (1997) 911
17. Han D.H., Zhu J.G., and Judy J.H. J. Appl. Phys. 81 (1997) 4996
18. Choe G., and Gupta S. Appl. Phys. Lett. 70 (1997) 1766
19. Choe G., and Gupta S. IEEE Trans. Magn. 33 (1997) 3691
20. Allegranza O., and Chen M.-M. J. Appl. Phys. 73 (1993) 6218
21. Kim Y.K., Ha K., and Rea. L.L. IEEE Trans. Magn. 31 (1995) 3964
22. Kelly D.M., Fullerton E.E., Santa-Maria J., and Schuller I.K. Script. Metall. Mater. 33 (1995) 1603
23. Wu X.S., Bie Q.S., Lin Z.S., Hu A., Zhai H.R., and Jiang S.S. Mod. Phys. Lett. 13 (1999) 325
24. Kojima I., Li B., and Fujimoto T. Thin Solid Films 355-356 (1999) 385
25. van der Lee A. Sol. State Sci. 2 (2000) 257
26. Parrat L.G. Phys. Rev. 95 (1954) 359
27. Nevot L., and Croce P. Rev. Phys. Appl. 15 (1980) 761
28. Bahr D., Press W., Jebanski R., and Mantl S. Phys. Rev. B 47 (1993) 4385
29. Sinha S.K., Sirota E.B., Garoff S., and Stanley H.B. Phys. Rev. B 38 (1998) 2297
30. Holý V., Kubena J., Ohlídal I., Lischka K., and Plotz W. Phys. Rev. B 47 (1993) 15896
31. Kelly J.J.I.V., Barnes B.M., Flack F., Lagally D.P., Savage D.E., Friesen M., and Lagally M.G. J. Appl. Phys. 91 (2002) 9978
32. Nogués J., Costa J.L., and Rao K.V. Physica A 182 (1992) 532
33. Pfeifer P. Appl. Surf. Sci. 18 (1984) 146
34. Roughness Parameters [online], [Horsholm, Denmark]: Image Metrology A/S [cited 27 february 2007], Available from world wide web: http://www.imagemet.com/WebHelp/spip.htm#roughness_parameters.htm.
35. Malozemoff A.P. J. Appl. Phys. 63 (1988) 3874
36. Malozemoff A.P. Phys. Rev. B 35 (1987) 3679
37. Tsang C., Heiman N., and Lee K. J. Appl. Phys. 52 (1981) 2471