Modification by UV-light irradiation of the affinity for copper chemical vapour deposition of self-assembled monolayers of organosilanes on SiO2 substrates

Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7327-7338

  Semaltianos, N G ^a  

^a CNRS   (France)

Author keywords

Chemical vapour deposition; Copper; Selective deposition; Self assembled monolayers

Indexed keywords

COPPER; OXIDATION; PROTECTIVE ATMOSPHERES; SELF ASSEMBLED MONOLAYERS; SILICA; SUBSTRATES;

GRID MASK; ORGANOSILANES; SELECTIVE DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; COPPER; OXIDATION; PROTECTIVE ATMOSPHERES; SELF ASSEMBLED MONOLAYERS; SILICA; SUBSTRATES;

EID: 34047246685     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.01.046     Document Type: Article

References (36)

1. Gates S.M. Chem. Rev. 96 (1996) 1519
2. Kaloyeros A.E., and Eizenbraun E. Annu. Rev. Mater. Sci. 30 (2000) 363
3. A. Krishnammorthy, K. Chanda, S.P. Murarka, G. Ramanath, US Pattent Disclosure Docket #020752-000100US (2001).
4. Krishnamoorthy A., Chanda K., Murarka S.P., Ramanath G., and Ryan J.G. Appl. Phys. Lett. 78 (2001) 2467
5. P. Doppelt, French Patent 97 03 029, US Patent 6,130,345.
6. Tai-Yuan Chen, Ph.D. Thesis, Université de Paris 6, (2000).
7. Chen T.-Y., Vaissermann J., Ruiz E., Sénateur J.P., and Doppelt P. Chem. Mater. 13 (2001) 3993
8. Jain A., Farkas J., Kodas T.T., Chi K.-M., and Hampden-Smith J. Appl. Phys. Lett. 61 (1992) 2662
9. Cohen S.L., Liehr M., and Kasi S. Appl. Phys. Lett. 60 (1992) 1585
10. Winter C., Weckenmann U., Fischer R.A., Käshammer J., Scheumann V., and Mittler S. Chem. Vap. Depos. 6 (2000) 199
11. Huang J., and Hemminger J.C. J. Am. Chem. Soc. 115 (1993) 3342
12. Doppelt P., and Stelzle M. Microelectron. Eng. 33 (1997) 15
13. Ramanath G., Gui G., Ganesan P.G., Guo X., Ellis A.V., Stukowski M., Vijayamohanan K., Doppelt P., and Lane M. Appl. Phys. Lett. 83 (2003) 383
14. Schwartz P., Schreiber F., Eisenberger P., and Scoles G. Surf. Sci. 423 (1999) 208
15. Tada H., and Nagayama H. Langmuir 10 (1994) 1472
16. Tripp C.P., and Hair M.L. Langmuir 8 (1992) 1120
17. http://www.uvp.com/penray/mercury.html.
18. http://www.optical-filters.com/ug5.html.
19. Nguyen T., Charneski L.J., and Hsu S.T. J. Electrochem. Soc. 144 (1997) 2829
20. Seinfeld J.H. Atmospheric Chemistry and Physics of Air Pollution (1986), J. Wiley, New York
21. Demore W.B., and Raper O.F. J. Chem. Phys. 44 (1966) 1780
22. Snelling D.R., Baiamonte V.D., and Bair E.J. J. Chem. Phys. 44 (1966) 4137
23. Zhang Y., Terrill R.H., Tanzer T.A., and Bohn P.W. J. Am. Chem. Soc. 120 (1998) 2654
24. Huang J., Dahlgren D.A., and Hemminger J.C. Langmuir 10 (1994) 626
25. Tarlov M.J., and Newman J.G. Langmuir 8 (1992) 1398
26. Tarlow M.J., Burgess Jr. D.R.F., and Gillen G. J. Am. Chem. Soc. 115 (1993) 5305
27. Steer R.P., and Knight A.R. J. Phys. Chem. 72 (1968) 2145
28. Steer R.P., and Knight A.R. Can. J. Chem. 47 (1969) 1335
29. Capozzi G., and Modena G. "The Chemistry of the Thiol Group", Part 2, Chapter 17 (1974), Wiley, New York
30. Moulder J.F., Stickle W.F., Sobol P.E., and Bomben K.D. Handbook of X-Ray Photoelectron Spectroscopy (1992), Perkin-Elmer, Eden Prairie
31. Sinapi F., Delhalle J., and Mekhalif Z. Mater. Sci. Eng., C, Biomim. Mater., Sens. Syst. 22 (2002) 343
32. Hu M., Noda S., Okubo T., Yamaguchi Y., and Komiyama H. Appl. Surf. Sci. 181 (2001) 307
33. Senkevich J.J., Mitchell C.J., Yang G.-R., and Lu T.-M. Langmuir 18 (2002) 1587
34. Senkevich J.J., Yang G.-R., and Lu T.-M. Colloids Surf., A Physicochem. Eng. Asp. 207 (2002) 139
35. Nelen L.M., Fuller K., and Greenlief C.M. Appl. Surf. Sci. 150 (1999) 65
36. E.S. Beck, E.J. Karwacki Jr., R.J. Ciotti, T.A.J. Norman, European Patent 1180553, US Patent 2000-638586.