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Volumn 101, Issue 6, 2007, Pages

Roughening transition in nanoporous hydrogenated amorphous germanium: Roughness correlation to film stress

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS GERMANIUM; ROUGHENING TRANSITION; THIN FILM DEPOSITION; VOLMER-WEBER MODE;

EID: 34047181496     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2433699     Document Type: Article
Times cited : (7)

References (17)
  • 5
    • 30544449670 scopus 로고    scopus 로고
    • N. J. Podraza, G. M. Ferreira, C. R. Wronski, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 862, A 16.3.1 (2005).
    • N. J. Podraza, G. M. Ferreira, C. R. Wronski, and R. W. Collins, Mater. Res. Soc. Symp. Proc. 862, A 16.3.1 (2005).
  • 8
    • 34047104446 scopus 로고    scopus 로고
    • Applied-Materials-Epi-Centura platform, Ultima High Density Plasma Chemical Vapor Deposition (HDP-CVD) process chamber
    • Applied-Materials-Epi-Centura platform, Ultima High Density Plasma Chemical Vapor Deposition (HDP-CVD) process chamber.
  • 17
    • 12744256711 scopus 로고    scopus 로고
    • A. H. M. Smets, W. M. M. Kessels, and M. C. M. van de Sanden, Mater. Res. Soc. Symp. Proc. 808, A9.21.1 (2004).
    • A. H. M. Smets, W. M. M. Kessels, and M. C. M. van de Sanden, Mater. Res. Soc. Symp. Proc. 808, A9.21.1 (2004).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.