Implementation of diffractive optical element in four-wave mixing scheme for ex situ characterization of hydride vapor phase epitaxy-grown GaN layers

Review of Scientific Instruments

Volumn 78, Issue 3, 2007, Pages

  Jarasiunas, K ^a   Aleksiejunas, R ^a   Malinauskas, T ^a   Gudelis, V ^a   Tamulevicius, T ^b   Tamulevicius, S ^b   Guobiene, A ^b   Usikov, A ^c   Dmitriev, V ^c   Gerritsen, H J ^d  

^a VILNIUS UNIVERSITY   (Lithuania)

^b KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^c Technologies and Devices International Inc   (United States)

^d BROWN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC GRATING RECORDING; HOLOGRAPHIC BEAM SPLITTERS;

CARRIER CONCENTRATION; CARRIER LIFETIME; ENERGY GAP; EPITAXIAL LAYERS; FOUR WAVE MIXING; GALLIUM NITRIDE; OPTICAL BEAM SPLITTERS; VAPOR PHASE EPITAXY;

DIFFRACTION GRATINGS;

EID: 34047180594     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2712788     Document Type: Article

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