Orogenic movement mechanism for the formation of symmetrical relief features in copper nitride thin films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 208-212

  Ji, A L ^a   Du, Y ^a   Li, C R ^a   Wang, Y Q ^a   Cao, Z X ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; CRACKING (CHEMICAL); ELECTRON MOBILITY; FILM GROWTH; NANOSTRUCTURED MATERIALS; THERMODYNAMIC STABILITY;

ATOMIC MOBILITY; COPPER NITRIDE; OROGENIC MOVEMENT;

THIN FILMS;

EID: 34047164201     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2433970     Document Type: Article

References (19)

1. J. F. Pierson, Vacuum 66, 59 (2002).
2. T. Maruyama and T. Morishita, J. Appl. Phys. 78, 4104 (1995).
3. Y. Du, A. L. Ji, L. B. Ma, Y. Q. Wang, and Z. X. Cao, J. Cryst. Growth 280, 490 (2005).
4. K. J. Kim, J. H. Kim, and J. H. Kang, J. Cryst. Growth 222, 767 (2001).
5. T. Nosaka, M. Yoshitake, A. Okamoto, S. Ogawa, and Y. Nakayama, Appl. Surf. Sci. 169/170, 358 (2001).
6. L. Maya, Mater. Res. Soc. Symp. Proc. 282, 203 (1993).
7. T. Maruyama and T. Morishita, Appl. Phys. Lett. 69, 890 (1996).
8. M. G. Moreno-Armenta, A. Martínez-Ruiz, and N. Takeuchi, Solid State Sci. 6, 9 (2004).
9. D. Y. Wang, N. Nakamine, and Y. Hayashi, J. Vac. Sci. Technol. A 16, 2084 (1998).
10. M. Asano, K. Umeda, and A. Tasaki, Jpn. J. Appl. Phys., Part 1 29, 1985 (1990).
11. L. Maya, J. Vac. Sci. Technol. A 11, 604 (1993).
12. M. Ohring, Materials Science of Thin Films, 2nd ed. (Academic, San Diego, 2002), pp. 761-764.
13. A. L. Ji, R. Huang, Y. Du, C. R. Li, and Z. X. Cao, J. Cryst. Growth 295, 79 (2006).
14. A. L. Ji, C. R. Li, Y. Du, L. B. Ma, R. Song, and Z. X. Cao, Nanotechnology 16, 2092 (2005).
15. H. Y. Chen, Y. Gao, H. R. Zhang, L. B. Liu, H. C. Yu, H. F. Tian, S. S. Xie, and J. Q. Li, J. Phys. Chem. B 108, 12038 (2004).
16. A. Graff, D. Wagner, H. Ditlbacher, and U. Kreibig, Eur. Phys. J. D 34, 263 (2005).
17. I. Lisiecki, A. Filankembo, H. Sack-Kongehl, K. Weiss, M. P. Pileni, and J. Urban, Phys. Rev. B 61, 4968 (2000).
18. J. H. Wang, T. H. Yang, W. W. Wu, L. J. Chen, C. H. Chen, and C. H. Chu, Nanotechnology 17, 719 (2006).
19. F. W. Gayle, J. Mater. Res. 2, 1 (1987).