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Volumn 101, Issue 6, 2007, Pages

The determinants of hydrogen concentrations in hydrogenated amorphous silicon films prepared using a triode deposition system

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CONCENTRATION (PROCESS); FILM GROWTH; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRIODES;

AMORPHOUS SILICON FILMS; HYDROGEN CONCENTRATIONS; LIGHT SOAKING STABILITY; TRIODE DEPOSITION SYSTEM;

AMORPHOUS FILMS;

EID: 34047148315 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2715671 Document Type: Article

Times cited : (8)

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