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Volumn 92, Issue 9, 1990, Pages 5700-5711

Hydrogen desorption from the monohydride phase on Si(100)

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[No Author keywords available]

Indexed keywords


EID: 0001337564     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.458501     Document Type: Article
Times cited : (376)

References (44)
  • 29
    • 84950580651 scopus 로고    scopus 로고
    • all the figures, the dosage of hydrogen or deuterium atoms are given in arbitrary units. We have approximated the conversion of arbitrary units of exposure to hydrogen atom flux by assuming the probability of adsorption of hydrogen atoms on a Si(100) surface to be unity at zero coverage and that a monolayer coverage consists of [Formula Omitted] monohydride species/[Formula Omitted] of the silicon surface.
  • 39
    • 85034903783 scopus 로고    scopus 로고
    • Although microscopic reversibility does not require that atoms adsorb via the [Formula Omitted] state, it seems highly likely that they would do so.
  • 42
    • 84950580661 scopus 로고    scopus 로고
    • Chabal observes a single Si‐H stretching mode in the IR spectrum of the monohydride phase at low coverages. With increasing hydrogen atom exposure to the surface, two IR peaks are observed, corresponding to the symmetric and asymmetric stretch of the doubly occupied dimer, H‐Si‐Si‐H. This is consistent with a statistical population of monohydride sites rather than a propensity to form pairs of H atoms on the Si dimers (Ref. 31).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.