Chemical stability of nonwetting, low adhesion self-assembled monolayer films formed by perfluoroalkylsilanization of copper

Journal of Chemical Physics

Volumn 126, Issue 11, 2007, Pages

  Hoque, E ^a   Derose, J A ^a   Hoffmann, P ^a   Bhushan, B ^b   Mathieu, H J ^a  

^a EPFL   (Switzerland)

^b OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIWETTING; FRICTION FORCE MICROSCOPY (FFM); HEAT EXCHANGE SURFACES; PERFLUOROALKYLSILANIZATION;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; COPPER; INTERFACIAL ENERGY; SUBSTRATES; SURFACE TENSION; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLED MONOLAYERS;

EID: 34047103522     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2566333     Document Type: Article

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