Hysteresis and threshold voltage shift of pentacene thin-film transistors and inverters with Al2O3 gate dielectric

Applied Physics Letters

Volumn 90, Issue 13, 2007, Pages

  Koo, Jae Bon ^a   Ku, Chan Hoe ^a   Lim, Sang Chul ^a   Kim, Seong Hyun ^a   Lee, Jung Hun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ELECTRIC INVERTERS; GATE DIELECTRICS; HYSTERESIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THRESHOLD VOLTAGE;

DRAIN VOLTAGE; GATE VOLTAGE;

THIN FILM TRANSISTORS;

EID: 34047102884     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2717015     Document Type: Article

References (20)

1. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater. (Weinheim, Ger.) 14, 99 (2002).
2. G. Horowitz, Adv. Mater. (Weinheim, Ger.) 10, 365 (1998).
3. R. Schroeder, L. A. Majewski, and M. Grell, Adv. Mater. (Weinheim, Ger.) 16, 633 (2004).
4. T. B. Singh, N. Majanović, G. J. Matt, N. S. Sariciftci, R. Schwödiauer, and S. Bauer, Appl. Phys. Lett. 85, 5409 (2004).
5. E. J. Meijer, D. M. De Leeuw, S. Setayesh, E. van Veenendaal, B.-H. Huisman, P. W. M. Blom, J. C. Hummelen, U. Scherf, and T. M. Klapwijk, Nat. Mater. 2, 678 (2003).
6. S. D. Vusser, S. Steudel, K. Myny, J. Genoe, and P. Heremans, Appl. Phys. Lett. 88, 162116 (2006).
7. E. Cantatore and E. J. Meijer, Proceedings of the 29th European Solid-State Circuits Conference ESSCIRC'03 2003 (unpublished), p. 29.
8. G. Wang, D. Moses, A. J. Heeger, H. Zhang, M. Narasimhan, and R. E. Demaray, J. Appl. Phys. 95, 316 (2004).
9. A. Salleo and R. A. Street, J. Appl. Phys. 94, 471 (2003).
10. J. B. Koo, S. J. Yun, J. W. Lim, S. H. Kim, C. H. Ku, S. C. Lim, J. H. Lee, and T. Zyung, Appl. Phys. Lett. 89, 33511 (2006).
11. J. B. Koo, J. W. Lim, S. H. Kim, C. H. Ku, S. C. Lim, J. H. Lee, S. J. Yun, and Y. S. Yang, Electrochem. Solid-State Lett. 9, G320 (2006).
12. G. Gu, M. G. Kane, J. E. Doty, and A. H. Firester, Appl. Phys. Lett. 87, 243512 (2005).
13. L. Chua, J. Zaumsell, J. Chang, Eric C.-W. Ou, Peter K.-H. Ho, H. Sirringhaus, and R. H. Friend, Nature (London) 434, 194 (2005).
14. A. R. Völkel, R. A. Street, and D. Knipp, Phys. Rev. B 66, 195336 (2002).
15. W. Kim, A. Javey, O. Vermesh, Q. Wang, Y. Li, and H. Dai, Nano Lett. 3, 193 (2003).
16. A. Salleo, M. L. Chabinyc, M. S. Yang, and R. A. Street, Appl. Phys. Lett. 81, 4383 (2002).
17. R. A. Street, A. Salleo, and M. L. Chabinyc, Phys. Rev. B 68, 85316 (2003).
18. A. Salleo and R. A. Street, Phys. Rev. B 70, 235324 (2004).
19. Y. Liang, G. Dong, Y. Hu, L. Wang, and Y. Qiu, Appl. Phys. Lett. 86, 132101 (2005).
20. A. Dodabalapur, J. Baumbach, K. Baldwin, and H. E. Katz, Appl. Phys. Lett. 68, 2246 (1996).