Rapid coating of through-porous substrates by atomic layer deposition

Chemical Vapor Deposition

Volumn 12, Issue 11, 2006, Pages 655-658

  Ritala, Mikko ^a   Kemell, Marianna ^a   Lautala, Markus ^a   Niskanen, Antti ^a   Leskelä, Markku ^a   Lindfors, Sven ^b  

^a UNIVERSITY OF HELSINKI   (Finland)

^b Picosun Oy   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC PHYSICS; ATOMS; COATINGS; ELECTROCHEMICAL ELECTRODES; ELECTROLYTIC CAPACITORS; ELECTRONIC EQUIPMENT MANUFACTURE; FILM GROWTH; INTEGRATED CIRCUITS; NETWORKS (CIRCUITS); PHOTORESISTS; PHYSICAL VAPOR DEPOSITION; POROUS MATERIALS; PRINTED CIRCUIT BOARDS; PRINTED CIRCUIT MANUFACTURE; PULSED LASER DEPOSITION; STRUCTURAL DESIGN; SUBSTRATES;

3D CAPACITORS; 3D INTEGRATED CIRCUITS; ACCURATE CONTROLS; ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; CONFORMALITY; ELECTROCHEMICAL APPLICATIONS; GROWTH MECHANISMS; HIGH ASPECT RATIO STRUCTURES; MACROSCOPIC; MACROSCOPICALLY; NEW DESIGNS; POROUS MEDIAS; POROUS SUBSTRATES; REACTOR DESIGNS; UNIFORM COATINGS; X-RAY OPTICS;

ATOMIC LAYER DEPOSITION;

EID: 33947540432     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200604228     Document Type: Article

References (11)

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