Effect of oxygen partial pressure on the structural and optical properties of sputter deposited ZnO nanocrystalline thin films

Materials Letters

Volumn 61, Issue 10, 2007, Pages 2050-2053

  Singh, Preetam ^a   Chawla, Amit Kumar ^a   Kaur, Davinder ^a   Chandra, Ramesh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

Author keywords

Nanocrystalline thin films; Sputtering; X ray diffraction

Indexed keywords

NANOCRYSTALLINE MATERIALS; OPTICAL PROPERTIES; OXYGEN; PRESSURE EFFECTS; SPUTTER DEPOSITION; X RAY DIFFRACTION; ZINC OXIDE;

NANOCRYSTALLINE THIN FILMS; OXYGEN PARTIAL PRESSURE; TAUC'S RELATION;

THIN FILMS;

EID: 33947428399     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.08.013     Document Type: Article

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