Preparation of type-II MoS2 film by chemical bath deposition onto Si coated with electrolessly Ni

Materials Science and Engineering: B

Volumn 138, Issue 3, 2007, Pages 259-262

  Wei, Ronghui ^a   Yang, Haibin ^a,b   Du, Kai ^a   Fu, Wuyou ^a   Li, Minghui ^a   Yu, Qingjiang ^a   Chang, Lianxia ^a   Zeng, Yi ^a   Sui, Yongming ^a   Zhu, Hongyang ^a   Zou, Guangtian ^a  

^a JILIN UNIVERSITY   (China)

^b HENAN POLYTECHNIC UNIVERSITY   (China)

Author keywords

Chemical bath deposition; Electrolessly Ni; MoS2 film; Optical reflective spectra; Si substrate

Indexed keywords

ANNEALING; CRYSTALLITES; ELECTROLESS PLATING; FIELD EMISSION MICROSCOPES; MOLYBDENUM COMPOUNDS; X RAY DIFFRACTION;

CHEMICAL BATH DEPOSITION; OPTICAL BANDGAP; OPTICAL REFLECTIVE SPECTRA; SI SUBSTRATES;

THIN FILMS;

EID: 33947414868     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2007.01.024     Document Type: Article

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