Wavelength despersive spectroscopy analysis at high spectral resolution: Application to the study of Mo/Si multilayers

X-Ray Spectrometry

Volumn 36, Issue 2, 2007, Pages 72-75

  Jonnard, Philippe ^a   Maury, Hélàne ^a   André, Jean Michel ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELECTROMAGNETIC WAVE EMISSION; EMISSION SPECTROSCOPY; MULTILAYERS; SPECTRAL RESOLUTION;

AMORPHOUS SI; EMISSION BANDS; EXPERIMENTAL CONDITIONS; HIGH RESOLUTION; HIGH SPECTRAL RESOLUTION; MO/SI MULTILAYER; NON DESTRUCTIVE; PHOTON ENERGY RANGE; SI ATOMS; X RAY EMISSION SPECTROSCOPY;

SPECTROMETERS;

EID: 33947282191     PISSN: 00498246     EISSN: 10974539     Source Type: Journal    
DOI: 10.1002/xrs.940     Document Type: Article

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