A comparison between chemical and sputtering methods for preparing thin-film silver electrodes for in situ ATR-SEIRAS studies

Electrochimica Acta

Volumn 52, Issue 14, 2007, Pages 4605-4613

  Delgado, José Manuel ^a   Orts, José Manuel ^a   Rodes, Antonio ^a  

^a UNIVERSITY OF ALICANTE   (Spain)

Author keywords

ATR SEIRAS; Chemical deposition; Silver electrodes; Sputtering; Thin films

Indexed keywords

CHARGE DENSITY; CHEMICAL VAPOR DEPOSITION; ELECTROCHEMISTRY; GRAIN SIZE AND SHAPE; IN SITU PROCESSING; SILVER; SPUTTERING; THIN FILMS;

ATR-SEIRAS; INTENSITY ENHANCEMENT; SILVER ELECTRODES;

ELECTRODES;

EID: 33947176619     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2006.12.045     Document Type: Article

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