Electroless deposition of gold thin films on silicon for surface-enhanced infrared spectroelectrochemistry

Electrochemistry Communications

Volumn 4, Issue 12, 2002, Pages 973-977

  Miyake, Hiroto ^a   Ye, Shen ^a,b   Osawa, Masatoshi ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Adsorption; Carbon monoxide; Electroless deposition; Gold; Infraredspectroscopy; P Nitrobenzoic acid

Indexed keywords

GOLD; SILICON;

ADHESION; ADSORPTION; ARTICLE; ELECTROCHEMISTRY; ELECTRODE; EVAPORATION; FILM; INFRARED RADIATION; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; REPRODUCIBILITY; SURFACE PROPERTY; VACUUM;

EID: 0036896539     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1388-2481(02)00510-6     Document Type: Article

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